Engineering Ceramic Co.,( EC © ™) Report:
ALD (Atomic Layer Deposition) integrated bubbler is the key container components which used to store precursor materials in the atomic layer deposition process, it’s could help contain the precursor vapor in a flow of buffer gas. Not only for ALD, also use for Chemical Vapor Deposition (CVD), Metal-organic Chemical Vapor Deposition (MOCVD).
On week 28, EC has been delivered an customized Vacuum Aviation Plug Electrode for ALD (Atomic Layer Deposition) Liquid Precursor Vapor Delivery System.
Application
Semiconductor Manufacturing:
In chip manufacturing, in order to grow high-quality gate insulating layers (such as high-κ dielectric films), metal interconnect layers and other film structures, the ALD source bottles hold the corresponding precursors to ensure precise atomic layer deposition, which plays an important role in improving the performance of chips and reducing power consumption.
Micro-Electro-Mechanical Systems (MEMS):
They are used to prepare various films in MEMS devices, such as the sensitive films of sensors and the functional films on the surfaces of micro mechanical structures, helping to improve the sensitivity, stability and other performance indicators of MEMS devices. Optical
Coating Field:
They can store the precursors used for depositing optical films (such as anti-reflective films, reflective films, etc.). Through the ALD process, films that meet the optical performance requirements can be precisely grown on the substrates such as optical lenses and display screens to improve the transmittance, reflectance and other optical characteristics of optical products.
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